Home > Products > 光刻胶 > Nano silver wire photoresist

BRTHRPER-651A Nano silver wire photoresist

BRTHRPER-651A Nano silver wire photoresist
BRTHRPER-651A银纳米线光阻剂用于制造20-50um线宽线距L/S透明电容图型;具有在玻璃基材、柔性基材或显示器表面涂布透明导电膜的特性。光刻电容图型线条精度高,方块电阻在30-100Ω/□范围可选,CD Loss低于1um。同时具有优良的耐酸耐碱,耐UV等性

Application

It is used to fabricate ultra thick (50-200um) and medium thickness (10-50um) MEMS microstructures, as well as ordinary film thickness (0.3-10um) of various shapes such as holes and characters; suitable for I, G lines, X-ray, e-beam exposure

Product introduction

Aftersales service

如接到使用方技术服务请求后48小时内,将用电话、传真、E-mail提供解决方案或派人前往协助解决

Online Service:

服务热线:
13164732710